Numerical profile correction of microwave cavity resonance spectroscopy measurements of the electron density in low-pressure discharges

Low-temperature plasmas are widely studied in laboratory environments and form the backbone of many industrial processes. Highly energized electrons enable processes such as ionization, dissociation, plasma chemical reactions, while heavy species, neutral gas atoms molecules, remain near room temperature. Hence, understanding electron dynamics is crucial to control optimization their applications. In this contribution, we investigated impact density profile correction on microwave cavity resonance spectroscopy (MCRS) a diagnostic tool for low-pressure discharges. Following standard practice, first obtained volume-averaged by assuming uniform interpretation MCRS technique. Second, compare experiments with numerical model solved using PLASIMO software evaluate predictive capabilities. Third, profile-corrected densities means incorporating numerically distribution solution resonant electric field experimental data MCRS. Although agree closely found from model, it shown that implementing spatial leads significant data. The developed strategy could easily be implemented other situations deploying non-invasive technique measuring density.